Explanation of the causes of Ra deterioration and changes in polishing rate: "DP-equipped modified carrier"
The roughness of the PAD after the dress may not be a defect, but rather a sign of optimal condition. We will achieve PAD control according to the conditions.
After dressing, the PAD becomes rough, and while the polishing rate improves, the Ra worsens. This phenomenon is not a defect; it may indicate that the diamond abrasive is functioning properly and that the PAD surface is in an open state. The DP modified carrier offers a lineup of diamond pellets in various grits, allowing for selection based on processing conditions and required quality. Furthermore, by optimizing the protrusion of the diamonds, we can control the balance between the rate and surface roughness. Additionally, we are currently offering a one-month free loan, allowing you to verify the optimal dressing conditions and PAD state in an actual machine environment.
- Company：八千代マイクロサイエンス
- Price：Other
